Features of TiN film deposition by the vacuum-arc method |
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| Authors: | A Z Khamdokhov R Sh Teshev Z M Khamdokhov V S Kulikauskas P N Chernykh |
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| Institution: | 1. Kabardino-Balkar State University, Nal’chik, Russia
2. Skobeltsyn Research Institute of Nuclear Physics, Moscow State University, Moscow, Russia
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| Abstract: | The chemical homogeneity of TiN thin films produced by the sputtering of a titanium target in a nitrogen atmosphere are studied using atomic-force microscopy and the backscattering of helium ions. It is established that TiN films of submicron thickness contain titanium nanoparticles, the number of which increases with decreasing nitrogen pressure. |
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