a Friedrich-Schiller-University Jena, Institute of Physical Chemistry, Lessingstrasse 10, D-07743, Jena, Germany
b Friedrich-Schiller-University Jena, Institute of Solid State Physics, Max-Wien-Platz 1, D-07743, Jena, Germany
Abstract:
The damaging of 6H-SiC by ion implantation (Ar+, 320 keV) leads to the formation of a light-absorbing surface layer with a thickness of about 0.4 μm and a dielectric function which indicates a disordering of the crystal structure. Raman spectra show the existence of amorphous carbon, silicon and silicon carbide. Ion bombardment with 1.4 MeV He+ ions generates a 3 μm thick surface layer with small lattice distortions and light-absorbing centers and a 0.4 μm thick interface layer with a larger refractive index.