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Influence of substrate nature and growth conditions on the morphology of thin DMOAP films
Authors:I LELIDIS  C ÖEDMAN
Institution:1. Laboratoire de Physique de la Matière Condensée, Université de Picardie, 33 rue Saint-Leu, 80039 Amiens, France;2. Département de Physique, Institut de Génie Atomique, Ecole Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland
Abstract:We report some preliminary results on the morphology of thin N,N -dimethyl-n-octadecyl-3-aminopropyltrimethoxysilyl chloride (DMOAP) films. When deposited on a glass substrate, DMOAP forms a mono- or multi-layer structure parallel to the substrate. The surface topography of the film is probed by atomic force microscopy. In general, the free surface of such a film is not flat and smooth. Islands and holes are formed on the free surface of the films when a sufficiently flat substrate is used. The thin film surface topography depends strongly on the nature of the bare substrate, the curing conditions, and the immersion time of the substrate in the DMOAP solution. The film is always rougher than the bare substrate used. Annealing roughens the surface of the alkoxysilane thin films deposited on a glass substrate. For films on glass plates covered with an indium tin oxide layer, annealing has minor effects. The surface topography affects the microstructure of homeotropic smectic samples.
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