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Pretilt angle generation by UV exposure during imidization of polyimide
Authors:Dae-Shik Seo  Hyung-Kyu Kim  Hee-Jong Jeon
Affiliation:1. Department of Electrical and Computer Engineering, College of Engineering, Yonsei University, 134 Shinchon-dong, Seodaemun-ku, Seoul 120-749, Korea;2. Department of Electrical Engineering, College of Engineering, Soongsil University, 1-1 Sangdo 5-dong, Dongjack-ku, Seoul 156-743, Korea
Abstract:We investigated pretilt angle generation and liquid crystal (LC) alignment by ultraviolet exposure during the imidization of polyimide (PI). The generated pretilt angle of a nematic (N) LC using an in situ photo-alignment method is smaller than that using a conventional photo-alignment method on a surface of PI having side chains. The NLC pretilt angles using an in situ photo-alignment method injected at isotropic phase increased with annealing were observed.
Keywords:
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