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X射线衍射多晶谱计算机深度层析技术探索
引用本文:骆建,陶琨. X射线衍射多晶谱计算机深度层析技术探索[J]. 物理学报, 1995, 44(11): 1793-1797
作者姓名:骆建  陶琨
作者单位:清华大学材料科学研究所,北京100084
摘    要:提出了一种可用于将来自不同真实深度处的X射线衍射谱信息各自分离出来的技术方案,可以得出不同深度处的衍射强度、峰位和线形.该方法是定量和无损的,并且其深度尺度是真实尺度.此外并提出了吸收深度的概念.这一技术可称为直接法X射线衍射计算机深度层析技术,其可行性用Ni/Mo.双层膜样品进行了初步验证.该方法可应用于定量无损地测量峰形、峰位和峰强的深度剖面,并有可能用于界面层分析.关键词

关 键 词:X射线衍射谱 计算机深度层析 镍/钼膜 CT
收稿时间:1994-09-01

COMPUTER DEPTH PROFILING ANALYSIS METHOD FOR X-RAY DIFFRACTION POLYCRYSTALLINE PATTERNS
LUO JIAN and TAO KUN. COMPUTER DEPTH PROFILING ANALYSIS METHOD FOR X-RAY DIFFRACTION POLYCRYSTALLINE PATTERNS[J]. Acta Physica Sinica, 1995, 44(11): 1793-1797
Authors:LUO JIAN and TAO KUN
Abstract:A new method to extract X-ray polycrystalline diffraction patterns diffracted from different depth in real scale is pnesented. In this method the X-ray polycrystalline diffraction data of surface layer are collected at different incident angles, and then the X-ray diffraction patters diffracted from thin sheets at different depth are extracted directly by some special mathematical method. So the depth profiles of peak intensity, peak position and line profile can be obtained quantitatively and nondestrnctively. The algorithm was deduced in theory, and the feasibility of this method was primarily tested with a Ni/Mo film sample with prefered orientation. This method has the prospective application in the area of the thin films and its reactions, interface and surface processing studies.
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