Silylene–Nickel Promoted Cleavage of B−O Bonds: From Catechol Borane to the Hydroborylene Ligand

The first 16 valence electron [bis(NHC)](silylene)Ni⁰ complex 1 , [(^TMSL)ClSi:→Ni(NHC)₂], bearing the acyclic amido‐chlorosilylene (^TMSL)ClSi: (^TMSL=N(SiMe₃)Dipp; Dipp=2,6‐Prⁱ₂C₆H₄) and two NHC ligands (N‐heterocyclic carbene=:C[(Prⁱ)NC(Me)]₂) was synthesized in high yield and structurally characterized. Compound 1 is capable of facile dihydrogen activation under ambient conditions to give the corresponding HSi‐NiH complex 2 . Most notably, 1 reacts with catechol borane to afford the unprecedented hydroborylene‐coordinated (chloro)(silyl)nickel(II) complex 3 , {[cat(^TMSL)Si](Cl)Ni←:BH(NHC)₂}, via the cleavage of two B−O bonds and simultaneous formation of two Si−O bonds. The mechanism for the formation of 3 was rationalized by means of DFT calculations, which highlight the powerful synergistic effects of the Si:→Ni moiety in the breaking of incredibly strong B−O bonds.