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An in situ atomic force microscope for normal‐incidence nanofocus X‐ray experiments |
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| Authors: | M. V. Vitorino Y. Fuchs T. Dane M. S. Rodrigues M. Rosenthal A. Panzarella P. Bernard O. Hignette L. Dupuy M. Burghammer L. Costa |
| Affiliation: | 1. ESRF – The European Synchrotron, 71 Avenue de Martyrs, 38000 Grenoble, France;2. Biosystems and Integrative Sciences Institute (BioISI), Faculdade de Ciências, Universidade de Lisboa, Campo Grande, 1749-016Lisboa, Portugal |
| Abstract: | A compact high‐speed X‐ray atomic force microscope has been developed for in situ use in normal‐incidence X‐ray experiments on synchrotron beamlines, allowing for simultaneous characterization of samples in direct space with nanometric lateral resolution while employing nanofocused X‐ray beams. In the present work the instrument is used to observe radiation damage effects produced by an intense X‐ray nanobeam on a semiconducting organic thin film. The formation of micrometric holes induced by the beam occurring on a timescale of seconds is characterized. |
| Keywords: | in situ atomic force microscopy radiation damage semiconducting organic thin films |