A1.3 μm strained quantum well laser on a graded InGaAs buffer with a GaAs substrate

We grew a 1.3 μm strained-layer quantum well (SL-QW) laser with InGaP cladding layers on a lattice-relaxation buffer layer by metalorganic vapor phase epitaxy. For the lattice-relaxation buffer, we used a compositionally graded InGaAs/GaAs structure. The significantly reduced surface roughness of the InGaP cladding layers achieved by supplying a large amount of H₂Se enables CW operation of our 1.3 μm SL-QW laser. We achieved a low threshold current of less than 10 mA and a high characteristic temperature of 100K around room temperature.