Electrochemically deposited ZnO films: an XPS study on the evolution of their surface hydroxide and defect composition upon thermal annealing

Electrodeposition from ZnCl₂ aqueous solution was performed to grow ZnO thin films on the surface of polycrystalline copper plates. Electrochemical parameters for deposition were optimized by means of cyclic voltammetry (CV). The morphology of the deposits was studied via scanning electron microscopy (SEM), and their chemical composition was ascertained by means of X-ray photoelectron spectroscopy (XPS). The effects of changing the deposition bath temperature (T _bath) and the role played by post-deposition treatments, such as temperature and time of annealing in air, were studied. SEM images of freshly deposited vs. annealed samples have shown that in the former case the films display a rough morphology with mixed grain/hexagonal platelets structures and in the latter smaller but more uniformly dispersed cubic grains. T _bath is found to be the key parameter to induce the different morphology in the deposited films, which reflects in a different chemical reactivity of surface species, as found on the basis of the binding energies and relative quantitative ratios between Zn 2p and O 1s peaks. In fact, a higher T _bath favours a more efficient desorption of OH groups upon annealing, the O 1s peak resulting to much more drastically modified oxide/hydroxide intensity ratio with respect to the case of the sample deposited at lower T _bath.