|
|||||
|
|
Interference inspection of the aspherical components of an objective for nanolithography |
|
| Authors: | N. B. Voznesensky E. V. Gavrilov A. P. Zhevlakov V. K. Kirillovskiĭ P. V. Orlov |
| Affiliation: | (1) Mechanics and Optics, St. Petersburg State University of Information Technologies, ul. Sablinskaya 14, St. Petersburg, 197101, Russia;(2) Vavilov State Optical Institute, All-Russia Research Center, Birzhevaya liniya 12, St. Petersburg, 199034, Russia |
| Abstract: | Methods and schemes to inspect the EUV mirror shape are developed on the basis of a point diffraction interferometer with computer processing of interferograms. A measurement accuracy to within 0.001 of a wavelength in the visual range is achieved. |
| Keywords: | |
| 本文献已被 SpringerLink 等数据库收录！ | |