Study of atomic force microscopy nanoindentation for the development of nanostructures |
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Authors: | M Sirena S Fusil K Bouzehouane J-M George V Cros |
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Institution: | aUnite Mixte de Physique CNRS/Thales, Campus de Polytechnique. 1 Avenue A. Fresnel, 91767 Palaiseau, France;bUniversité d’Evry, Bâtiment des Sciences, rue du père Jarlan, 91205 Every, France |
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Abstract: | We have studied the fabrication of atomic force microscope (AFM) based nanotemplates using electrically controlled indentation (ECI) and a composite barrier (photoresist/alumina) that is resistant to the lithography process and presents good mechanical properties for indentation. The indentation process is affected by several factors such as the indentation speed, the trigger voltage and the barrier type. We have used the nanotemplate technique to fabricate small gold–gold nanocontacts (1–10 nm). In this limit, the size of the contacts that is obtained through the indentation process seems to be stochastic. However, low dimension, clean metallic contacts were achieved with high temporal stability and compatible with low temperature measurements. The fabricated nanotemplates are versatile and can be used in a wide range of applications, from nanojunctions to connecting a single nano-object. Small area metallic contacts can be used to study spin injection or ballistic transport. |
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Keywords: | AFM Nanoindentation Mesoscopic contacts |
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