Magnetic fluid microstructure curved surface uniform embossing and photocuring process technology |
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| Authors: | Rong‐Horng Chen Yung‐Jin Weng Sen‐Yeu Yang |
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| Institution: | 1. Department of Mechanical and Energy Engineering, National Chiayi University, Chiayi City, Taiwan;2. Center of Energy Research and Sensor Technology, National Chiayi University, Chiayi City, Taiwan;3. Department of Mechanical Engineering, National Taiwan University, Taipei, Taiwan |
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| Abstract: | By use of magnetism and magnetic fluid embossing technology, and in combination with the surface microstructure roughness improvement of seal‐film, this paper aimed to reach the purpose of magnetic fluid being driven under the magnetic force of an electromagnetic chuck, where the magnetic particles can be evenly scattered and stacked on the surface of the seal‐film in order to uniformly lift and convey the microstructure curved surface magnetic embossing force; thus, creating magnetic pressure in the embossing process of a microstructure curved surface. Moreover, during the process, photocuring technology is integrated with the technical features of soft lithography in order to provide more uniform curved surface embossing and photocuring process technology through the combination of fluid and magnetic force. Copyright © 2015 John Wiley & Sons, Ltd. |
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| Keywords: | magnetic fluid curved surface embossing microstructure roughness |
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