Indium oxide thin-film holographic recorders grown by excimer laser reactive sputtering |
| |
| Authors: | C Grivas DS Gill S Mailis L Boutsikaris NA Vainos |
| |
| Institution: | (1) Foundation for Research and Technology-Hellas (FO.RT.H.), Institute of Electronic Structure and Laser, Laser and Applications Division, P.O.BOX 1527, Heraklion 71 110, Crete, Greece (Fax: +30-81/391-318, E-mail: drig@iesl.forth.gr), GR |
| |
| Abstract: | 2 O3) thin films on glass substrates is performed by pulsed laser ablation of a metallic indium target in an oxygen atmosphere.
X-ray diffraction analysis verifies that a transition, from amorphous to polycrystalline film growth, occurs at a temperature
of 150 °C. Films grown under optimized conditions exhibit optical transmission higher than 80% in the visible light. Ultraviolet
radiation (λ= 325 nm) induced dynamic holographic recording in films deposited at specific temperature and oxygen pressure
settings is also demonstrated.
Received: 25 April 1997/Accepted: 27 May 1997 |
| |
| Keywords: | PACS: 81 15 Fg 42 70 Ln 42 40 |
| 本文献已被 SpringerLink 等数据库收录！ |
|
