Pulsed-Spray Radiofrequency Plasma Enhanced Chemical Vapor Deposition of CuInS2 Thin Films |
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Authors: | Rene G. Rodriguez Daniel J. V. Pulsipher Lisa D. Lau Endrit Shurdha Joshua J. Pak Michael H. Jin Kublinder K. Banger Aloysius F. Hepp |
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Affiliation: | (1) Department of Chemistry, Idaho State University, Pocatello, ID 83209, USA;(2) Ohio Aerospace Inst., 22800 Cedar Point Rd., Cleveland, OH 44142, USA;(3) Photovoltaic Branch, NASA GRC, Cleveland, OH 44135, USA |
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Abstract: | Thin films of CuInS2 were grown on various substrates at a temperature of 523 K from two metal-organic precursors using radiofrequency plasma enhanced chemical vapor deposition (PECVD). Two precursor molecules, with different solubility properties, were dissolved in appropriate solvents and sprayed into the plasma region in the PECVD chamber. The resulting films were examined for atomic composition, growth rate, crystalline orientation, and uniformity. Films made from each precursor differed in thickness, atomic composition, and crystallinity. The uniformity of the film was fairly good from near the edge to the center of the substrate, and evidence for a chalcopyrite-like structure was found in several samples deposited from one of the precursor molecules. |
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Keywords: | PECVD CuInS2 Liquid-spray Single-source precursor |
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