| 纳米氧化铈的制备及其抛光性能的研究 |
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| 引用本文： | 张鹏珍,雷红,张剑平,施利毅. 纳米氧化铈的制备及其抛光性能的研究[J]. 光学技术, 2006, 32(5): 682-684 |
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| 作者姓名： | 张鹏珍 雷红 张剑平 施利毅 |
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| 作者单位： | 上海大学,纳米中心,上海,200444;上海大学,理学院,上海,200444;上海大学,纳米中心,上海,200444;上海大学,理学院,上海,200444 |
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| 基金项目： | 国家自然科学基金(50575131)，上海市纳米专项资助项目(0452nm013) |
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| 摘 要： | 采用溶胶-凝胶法制备了纳米CeO2粉体,并采用XRD、TOF-SIMS对其进行了表征。结果表明平均晶粒度在13.3nm,粒度分布均匀。进而研究了纳米CeO2在玻璃基片抛光中的抛光性能。ZYGO形貌仪表明,抛光后其表面平均粗糙度值(Ra)可降低到0.6nm左右。原子力显微镜(AFM)在5μm×5μm范围内测得基片表面粗糙度Ra值为0.281nm,表面光滑,划痕等表面微观缺陷明显改善。
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| 关 键 词： | 纳米CeO2 化学机械抛光 玻璃基片 |
| 文章编号： | 1002-1582(2006)05-0682-03 |
| 修稿时间： | 2005-09-01 |
Preparation of nano-sized CeO2 and its polishing performances |
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| ZHANG Peng-zhen,LEI Hong,ZHANG Jian-ping,SHI Li-yi. Preparation of nano-sized CeO2 and its polishing performances[J]. Optical Technique, 2006, 32(5): 682-684 |
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| Authors: | ZHANG Peng-zhen LEI Hong ZHANG Jian-ping SHI Li-yi |
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| Abstract: | With advanced electro-manufacture developing so fast,glass substrate as a kind of widely used material in the mechanical manufacture is forced to be ultra-smooth.Nano-sized CeO_2 was prepared by sol-gel method and characterized by X-ray diffraction and TOF-SIMS.It shows that the average particle diameter is 13.3nm and particle size distribution is uniform.The polishing performances of nano-sized CeO_2 on glass substrate were studied.ZYGO profiler indicated that the average roughness(Ra) of the surface was reduced to about 0.6nm.Atom Force Microscopy(AFM) showed that a super smooth surface with Ra of 0.281nm was obtained within 5μm×5μm area and micro-defects such as micro-scratches can hardly be observed. |
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| Keywords: | nano-sized CeO_2 chemical-mechanical polishing(CMP) glass substrate |
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