| Probing Cu Diffusion Barrier Layers on Porous Low-Dielectric-Constant Films by Posireonium Annihilation Lifetime Spectroscopy |
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| 作者姓名： | 胡一帆 SUN Jia-Ning Gidley D．W． |
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| 作者单位： | [1]Department of Physics, Huazhong University of Science and Technology, Wuhan 430074 [2]Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA |
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| 基金项目： | Supported partially by the National Natural Science Foundation of China under Grant No 60476011. |
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| 摘 要： | Two kinds of Cu diffusion barrier layers, sealed films and capped films, on nanoporous low-dielectric-constant films are investigated by positronium annihilation lifetime spectroscopy （PALS）. We have found that the minimum thickness of Ta to form an effective diffusion barrier is affected by the pore size. The films with large pores require thick barrier layers to form effective diffusion barriers. In addition, a possible ultra-thin diffusion barrier, i.e. a plasma-induced densification layer, has also been investigated. The PALS data confirm that a porous low-dielectric-constant thin film can be shrunk by exposure to plasma. This shrinkage is confined to a surface layer of collapsed pores and forms a dense layer. The dense layer tends to behave as Ps （positronium） diffusion barriers. Indeed, the controlled thin “skin” layer could prevent Cu diffusion into the underlying dielectrics.
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| 关 键 词： | 薄膜 低传导性 衰减寿命 光谱学 扩散屏障层 |
| 收稿时间： | 2005-04-27 |
| 修稿时间： | 2005-04-27 |
Probing Cu Diffusion Barrier Layers on Porous Low-Dielectric-Constant Films by Posireonium Annihilation Lifetime Spectroscopy |
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| HU Yi-Fan, SUN Jia-Ning, Gidley D. W..Probing Cu Diffusion Barrier Layers on Porous Low-Dielectric-Constant Films by Posireonium Annihilation Lifetime Spectroscopy[J].Chinese Physics Letters,2005,22(11):2906-2909. |
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| Authors: | HU Yi-Fan SUN Jia-Ning Gidley D W |
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