Three-dimensional analysis of trace elements with the CAMECA IMS 4F |
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Authors: | H N Migeon M Schuhmacher J J Le Goux and B Rasser |
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Institution: | (1) CAMECA, 103 Bd. St-Denis, B.P. 6, F-92403 Courbevoie Cédex, France |
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Abstract: | Summary The CAMECA IMS 4F operates in the microprobe and microscope modes with submicron lateral resolutions. The high useful yields obtained via the appropriate primary ion beam species and high transmission ion optical system give access to trace analysis in small structures. As an example, a depth profile of arsenic in silicon performed at 5,000 mass resolution in a 8 m2 area allows detection of 1.1016 at/cm3 (0.2 ppm).
Dreidimensionale Analyse von Spurenelementen mit dem CAMECA IMS 4F |
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