Formation of p-type layer by KrF excimer laser doping of carbon into GaAs in CH4 gas ambient

Carbon doping of GaAs using a KrF excimer laser to form a p-type active layer is described. Methane gas (CH₄) was used as a source of the C acceptor. Various quantities such as sheet resistance, surface carrier density, Hall mobility, and depth profile of C-doped GaAs are measured as the functions of laser fluence and laser pulse. It is shown that C atoms are doped only within a limited depth as shallow as 50 nm or less and with extremely high concentration exceeding 1×10²¹ cm^–3. The maximum activation efficiency is found to be 69.0%. Laser induced changes of surface morphologies and electron diffraction patterns are also discussed. Furthermore, non-alloyed ohmic contacts using laser-doped p-type GaAs are demonstrated.