Electroreflectance in GeSi alloys under hydrostatic pressure |
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Authors: | E Schmidt K Vedam |
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Institution: | Materials Research Laboratory, The Pennsylvania State University, University Park, Pennsylvania 16802, USA |
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Abstract: | From the electroreflectance spectra measured under hydrostatic pressure to 7 kbar we have determined the pressure coefficients for germanium (dE1/dP = 7.8 ± 0.4−6eV/bar, dP = 1.4 ± 0.8 10−6eV/bar), for Si (dE′o/dP = 1 ± 1 10−6eV/bar, dE1dP = 6.2 ± 0.4 10−6eV/bar) and for GeSi alloys in the entire composition region. For the composition 80–100% of Si which is widely discussed in the literature, we could distinguish two maxima with substantially different pressure coefficients. The absolute experimental values of dE/dP agree rather well with theoretical values which, together with composition shift of electroreflectance peaks, enable us to connect the peak E1 predominantly with λ and L and E′o with Г and Δ transitions in the entire composition region. |
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