Emission characteristics of mixed gas plasmas in low-pressure glow discharges |
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| Affiliation: | 1. Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami 090-8507, Japan;2. Graduate School of Engineering, Muroran Institute of Technology, Muroran 050-8585, Japan;3. VLSI Design and Education Center (VDEC), The University of Tokyo, Tokyo 113-8656, Japan;4. Graduate School of Information Science and Technology, Hokkaido University, Sapporo 060-0814, Japan;1. Division of Nanoscale Semiconductor Engineering, Hanyang University, 17 Haengdang-dong, Seoungdong-gu, Seoul 133-791, South Korea;2. Division of Materials Science & Engineering, Hanyang University, 17 Haengdang-dong, Seoungdong-gu, Seoul 133-791, South Korea |
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| Abstract: | Glow discharge optical emission spectrometry (GD-OES) with mixed plasma gases is reviewed. The major topic is the effect of type and content of gases added to an argon plasma on the emission characteristics as well as the excitation processes. Emphasis is placed on argon–helium, argon–oxygen, and argon–nitrogen mixed gas plasmas. Results for non-argon-matrix plasmas, such as neon–helium and nitrogen–helium mixtures, are also presented. Apart from the GD-OES, glow discharge mass spectrometry and furnace atomization plasma emission spectrometry with mixed plasma gases are also discussed. |
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