Multiplexed electrothermal vaporization sample introduction system for inductively coupled plasma spectrometry |
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Affiliation: | 1. Department of Chemistry, Art and Science Faculty, Balikesir University, 10100 Balikesir, Turkey;2. School of Geography, Earth and Environmental Sciences, University of Plymouth, Drake Circus, Plymouth, Devon PL4 8AA, UK;1. Department of Physical Chemistry, School of Science, Beijing University of Chemical Technology, Beijing 100029, China;2. Key Laboratory of Photochemistry, Center for Molecular Science, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China;1. Department of Chemistry, Graduate School of Science, Hiroshima University, Higashihiroshima, Japan;2. Application Center, Horiba Ltd., Kyoto, Japan;1. School of Space Science and Physics, Shandong University at Weihai, 264209, China;2. School of Marine Science and Technology, Harbin Institute of Technology at Weihai, Weihai 264209, China |
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Abstract: | A multiplexed electrothermal vaporization (ETV) system for sample introduction into an inductively coupled plasma was designed in an effort to increase sample turn-around time. Tungsten filaments (300 W), originally designed for overhead projectors, were chosen for use as ETVs to avoid the high power requirements associated with other ETV devices, e.g. graphite furnaces (2–3 kW). In short, we have multiplexed the thermal stages have been multiplexed such that a vaporization event can take place every 20 s. This represents a significant increase in the throughput typically associated with ETV-ICPMS, which is normally approximately 20–30 samples/h. Evaluated with respect to common figure of merit criteria, the performance of the multiplexed ETV system is similar to that seen with conventional graphite furnace ETV systems. However, several mass spectral interferences can be introduced by the presence of W into the plasma, which hinder the analysis of certain metals (Hg, Mo, etc.). Thus, other low power vaporizers (e.g. Re, Ta) should be considered for use in future systems. |
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