Surface characterization of Pt electrodes using underpotential deposition of H and Cu: Part I. Pt(100)

This paper is the first in a series describing the in situ surface characterization of platinum electrodes using H and Cu deposited at underpotentials. The surface of a Pt(100) electrode pretreated by simple flame annealing and quenching in aqueous sulfuric acid is shown to contain a high concentration of defects such as vacancies and self-adsorbed Pt atoms. Adsorbed hydrogen is more strongly bound at these defects than on a uniform Pt(100) surface. Potential cycling in 1 M HCl produces a higher concentration of defects, while oxide formation and reduction in 0.5 M H₂SO₄ has the opposite effect. The nature of (100)-like sites at a polycrystalline platinum electrode is also discussed.