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线形同轴耦合式微波等离子体CVD法制备金刚石薄膜
引用本文:杨志威,陈立民,耿春雷,唐伟忠,吕反修,苗晋琦,赵中琴. 线形同轴耦合式微波等离子体CVD法制备金刚石薄膜[J]. 人工晶体学报, 2004, 33(3): 432-435
作者姓名:杨志威  陈立民  耿春雷  唐伟忠  吕反修  苗晋琦  赵中琴
作者单位:北京科技大学材料科学与工程学院,北京,100083;北京科技大学材料科学与工程学院,北京,100083;北京科技大学材料科学与工程学院,北京,100083;北京科技大学材料科学与工程学院,北京,100083;北京科技大学材料科学与工程学院,北京,100083;北京科技大学材料科学与工程学院,北京,100083;北京科技大学材料科学与工程学院,北京,100083
摘    要:线形同轴耦合式微波等离子体CVD装置是一种利用微波天线产生轴向分布的等离子体柱的新型微波等离子体CVD装置.由于它产生的等离子体是沿微波天线分布的,因而可避免石英管式、石英钟罩式以及不锈钢谐振腔式微波等离子体CVD装置中等离子体的分布容易受到金属工件位置干扰的缺点.本文将首先讨论线形同轴耦合式微波等离子体CVD装置的工作原理,其后介绍利用此装置进行的金刚石薄膜沉积实验的初步结果.实验结果表明,利用线形同轴耦合式微波等离子体CVD装置,可在金属衬底上沉积出质量较好的金刚石薄膜.

关 键 词:线形同轴耦合  微波等离子体  CVD  金刚石薄膜
文章编号:1000-985X(2004)03-0432-04

Diamond Coatings Deposition Using the Linearly Coaxially Coupled Microwave Plasma CVD Device
YANG Zhi-wei,CHEN Li-min,GENG Chun-lei,TANG Wei-zhong,LU Fan-xiu,MIAO Jin-qi,ZHAO Zhong-qin. Diamond Coatings Deposition Using the Linearly Coaxially Coupled Microwave Plasma CVD Device[J]. Journal of Synthetic Crystals, 2004, 33(3): 432-435
Authors:YANG Zhi-wei  CHEN Li-min  GENG Chun-lei  TANG Wei-zhong  LU Fan-xiu  MIAO Jin-qi  ZHAO Zhong-qin
Abstract:The linearly coaxially coupled microwave plasma CVD device is a new microwave plasma CVD device bringing an axial extended plasma cylinder through a microwave antenna.As the plasma extends along the microwave antenna,its distribution is not affected by the metal workpiece location.However,the plasma distribution is easily affected by it in some other microwave plasma CVD devices such as quartz tube type, quartz bell-jar type and stainless steel resonant chamber type.The paper will first discuss the operating principle of the linearly coaxially coupled microwave plasma CVD device and then introduce the diamond coating deposition experiment using the device.The experimental results show the higher-quality diamond coating can be deposited on the metal workpiece using the linearly coaxially coupled microwave plasma CVD device.
Keywords:linearly coaxially coupled  microwave plasma  CVD  diamond coatings
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