Regulating the magnetic anisotropy by Hf thickness and heat treatment in Pt/Co/Hf films |
| |
Affiliation: | 1. Department of Material Physics and Chemistry, University of Science and Technology Beijing, Beijing, 100083, China;2. Beijing Laboratory o Metallic Materials and Processing for Modern Transportation, University of Science and Technology Beijing, Beijing, 100083, China;3. The 58th Research Institute, China Electronics Technology Group Corporation, Wuxi, 214035, China |
| |
Abstract: | Pt/Co/Hf multilayers were prepared by magnetron sputtering, and the magnetic anisotropy was effectively regulated by Hf thickness and heat treatment in Pt/Co/Hf films. The interface microstructures were characterized. The influence of the interface microstructure on magnetic properties was studied. The results show that the magnetic anisotropy in Pt/Co/Hf films is closely related to the interface microstructure, which is influenced by Hf thickness and the heat treatment temperature. Microstructure analysis shows that after the Pt(3)/Co(1.5)/Hf(1) film is heat-treated, the CoOx content increases, more CoPt(111) forms, the interface is smoother and sharper, and the roughness of the Co/Hf interface decreases. Several factors work together to cause the magnetic anisotropy of the sample to change from in-plane magnetic anisotropy (IMA)to perpendicular magnetic anisotropy (PMA). |
| |
Keywords: | Perpendicular magnetic anisotropy Annealing Oxygen migration X-ray photoelectron spectroscopy High-resolution transmission electron microscope |
本文献已被 ScienceDirect 等数据库收录! |
|