Laser direct patterning induced the tunable optical properties of indium tin oxide micro-hole arrays films |
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| Affiliation: | 1. Engineering Research Center of Optical Instrument and System, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, No.516 Jungong Road, Shanghai, 200093, China;2. Key Laboratory of High-temperature and High-pressure Study of the Earth''s Interior, Institute of Geochemistry, Chinese Academy of Sciences, Guiyang, 550081, China |
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| Abstract: | Here we introduce a facile method to fabricate patterned indium tin oxide (ITO) thin films via selective laser ablation at ambient conditions. By scanning the ITO thin films with focused Nd: YAG pulsed laser, the ITO thin films were selective ablated and patterned without using any conventional chemical etching or photolithography steps. Then we investigated the effects of scanning rate for the structure, morphology and optical properties of patterned ITO thin film. These results indicate that the epsilon-near-zero (ENZ) wavelength of ITO thin films can be tuned from 1100 nm to 1340 nm by adjusting the period of the micro-hole array in microstructure. The nonlinear absorption response of patterned ITO films was about 2.85 time than of the as-deposited ITO thin film. Additionally, the results of the Finite-Difference Time-Domain (FDTD) simulation are in good agreement with those of the experiments. |
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| Keywords: | Laser direct patterning ITO micro-hole arrays films Nonlinear optics FDTD |
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