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Fractal growth mechanism of sp3-bonded 5H-BN microcones by plasma-assisted pulsed-laser chemical vapor deposition
Authors:Komatsu Shojiro  Kazami Daisuke  Tanaka Hironori  Moriyoshi Yusuke  Shiratani Masaharu  Okada Katsuyuki
Institution:Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan. komatsu.shojiro@nims.go.jp
Abstract:Here we propose a repetitive photochemical reaction and diffusion model for the fractal pattern formation of sp(3)-bonded 5H-BN microcones in laser-assisted plasma chemical vapor deposition, which was observed experimentally and reported previously. This model describing the behavior of the surface density of precursor species gave explanations to (1) the "line-drawing" nature of the patterns, (2) the origin of the scale-invariant self-similarity (fractality) of the pattern, and (3) the temperature-dependent uniform to fractal transition. The results have implications for controlling the self-organized arrangements of electron-emitter cones at the micro-and nanoscale by adjusting macroscopically the boundary condition (L(X),L(Y)) for the deposition, which will be very effective in improving the electron field emission properties.
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