Physical chemistry of plasma-solution systems |
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| Authors: | A I Maksimov A V Khlyustova |
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| Institution: | (1) Institute of Chemistry of Solutions, Russian Academy of Sciences, Akademicheskaya ul. 1, Ivanovo, 153045, Russia |
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| Abstract: | The basic physical, physicochemical, and chemical processes occurring in the plasma-solution systems are considered. Data on correlation between the emission intensity of electrolyte-cathode glow discharge and the rate of nonequilibrium discharge-induced vaporization of the solution are presented. A mechanism for the appearance of the atomic emission threshold of metal atoms in the plasma zone is proposed. The role of chemically active species generated by ion bombardment in chemical processes occurring in solutions is shown. |
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