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Patterning in rapidly evaporated polymer solutions: formation of annular structures under evaporation of the poor solvent
Authors:Bormashenko Edward  Pogreb Roman  Musin Albina  Stanevsky Oleg  Bormashenko Yelena  Whyman Gene  Barkay Zahava
Institution:The Research Institute, The College of Judea and Samaria, 44837 Ariel, Israel. edward@yosh.ac.il
Abstract:Patterning in the intensively evaporated polymer solutions based on polystyrene and poor solvent (acetone) was investigated. SEM and AFM studies demonstrated that annular elements of the surface topography are formed in this case, in contrast to the honeycomb patterns obtained under the evaporation of the good solvent (chloroform). The authors suggest that the theory of viscous dewetting developed by de Gennes explains the phenomenon satisfactorily.
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