Surface patterns of block copolymers in thin layers after vapor treatment |
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Authors: | Peter ?ernoch,Petr &Scaron těpá nek,Miroslav &Scaron louf,Manfred Stamm |
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Affiliation: | a Institute of Macromolecular Chemistry of the Academy of Sciences of the Czech Republic, 162 06 Prague, Czech Republic b Institut für Polymerforschung Dresden, Hohe Strasse 6, Dresden 01069, Germany |
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Abstract: | A systematic study of formation of surface patterns in block copolymer thin layers after their exposure to solvent vapors was performed. The studied effect involves layers of thickness approximately equal to the ordering size of polymers - about 45 nm. Experiments were performed on three styrene - methacrylate derivative block copolymers, synthesized by living anionic polymerization: poly(4-octylstyrene)-block-poly(butyl methacrylate), poly(4-fluorostyrene)-block-poly(butyl methacrylate) and poly(p-octylstyrene)-block-poly(methyl methacrylate). The polymers were exposed to vapors of chloroform, 1,4-dioxane, hexane, acetone and tetrahydrofuran. |
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Keywords: | Block copolymers Thin layers Vapor treatment Self-assembly |
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