Chemical and structural order in silicon oxynitrides by methods of surface physics |
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| Authors: | J Finster J Heeg E-D Klinkenberg |
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| Institution: | Universität Rostock, Sektion Physik, D-O-2500, Rostock, UK |
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| Abstract: | A large number of thin amorphous layers of SiOxNy and several (crystalline) reference compounds (SiO2, Si3N4, Si2N2O) are studied. Although XANES and SEXAFS are well sulted to derive structural and chemical order, for these compounds many problems remain to be solved. We show how core level spectra (XPS, AES) can be used to gain such information (e.g. random bonding structure, N coordination, oxidation behaviour). |
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