多靶强流铯溅射离子源的研制

多靶强流铯溅射离子源是多种加速器中常用的离子源之一，在科学研究和工业生产领域的应用十分广泛。但是，目前商业化应用的该种离子源由欧美几个国家垄断，国内还没有厂家能够生产。为了提高加速器运行和建造中的自主化水平，研制了一种多靶强流铯溅射离子源。该离子源主要由离子源腔、换靶装置、冷却系统、控制箱等组成，根据功能需求对其关键部件进行结构设计，采用了全新的伺服电机驱动换靶方式，提供靶位微调功能和远程控制模式，并使用Opera-3D软件模拟优化结构参数和束流光路。经过测试，该离子源在中国原子能科学研究院的400 kV小型加速器质谱(AMS)装置上应用情况良好，换靶定位精准，供束稳定，束流参数达到进口离子源的参数指标，实现了预期目标。

Development of a Multi-Sample High Intensity Cs Sputter Ion Source

Multi-sample high intensity Cs sputter ion source is one of the common ion sources in various accelerators, and has been widely used in scientific research and industrial production. However, the commercial products of this kind of ion source are monopolized by several European and American countries, and currently no domestic manufacturer can produce it. In order to enhance the independent innovation capability in accelerator operation and development, a multi-sample high intensity Cs sputter ion source was specially developed. The ion source mainly consists of ion source cavity, target replacement device, cooling system and control cabinet. According to the functional requirements, the key components of ion source were designed. A new servo motor-driven target method was adopted to provide fine-tuning of target position and remote control mode. And the Opera-3D software was used to simulate beam trajectory and optimize structural parameters. After testing, the ion source has been successfully used in a 400 kV compact accelerator mass spectrometer(AMS) independently developed by the China Institute of Atomic Energy. The sample is accurately positioned, and the beam current is stable. Beam parameters are as good as those of imported ion source, so the expected goal has been achieved.