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MoO3和CuCl在γ-Al2O3表面分散速度和分散机理的研究
引用本文:徐献平,谢有畅,赵璧英,唐有祺. MoO3和CuCl在γ-Al2O3表面分散速度和分散机理的研究[J]. 物理化学学报, 1990, 6(3): 263-268. DOI: 10.3866/PKU.WHXB19900303
作者姓名:徐献平  谢有畅  赵璧英  唐有祺
作者单位:Institute of Physical Chemistry, Peking University
摘    要:

关 键 词:三氧化钼  氯化亚铜  分散  氧化铝  
收稿时间:1990-01-04
修稿时间:1990-02-14

Study on Dispersion Speed and Mechanism of MoO3 and CuCl on the Surface of γ-Al2O3
Xu Xian-Ping,Xie You-Chang,Zhao Bi-Ying,Tang You-Qi. Study on Dispersion Speed and Mechanism of MoO3 and CuCl on the Surface of γ-Al2O3[J]. Acta Physico-Chimica Sinica, 1990, 6(3): 263-268. DOI: 10.3866/PKU.WHXB19900303
Authors:Xu Xian-Ping  Xie You-Chang  Zhao Bi-Ying  Tang You-Qi
Affiliation:Institute of Physical Chemistry, Peking University
Abstract:It has been shown that many oxides and salts can disperse spontaneously onto supports with large surface area~[1]. A typical example studied widely is the dispersion of MoO_3 on γ-Al_2O_3. However, the research work about the dispersion mechanism and kinetics is quite few.Knozinger etc.~[2] suggested that the dispersion of MoO_3 onto the surface of γ-Al_2O_3 may occur through a "gas phase transport" mechanism mainly by assuming an intermediate MoO_2(OH)_2(g), and the presence of water is necessary. Their conclusion was based on a fact that after heating a mixture of MoO_3 and γ-Al_2O_3 in the presence of H_2O vapour at 450 ℃, the characteristic peak at 950 cm~(-1) of monolayer dispersed MoO_3 in Laser Raman Spectrum (in situ) appears, but after heating the mixture in dry oxygen, it can not be observed...
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