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Diffusion of silver associated with photodoping into amorphous chalcogenides
Authors:Masaaki Yamaguchi  Isamu Shimizu  Eiichi Inoue
Affiliation:Imaging Science and Engineering Laboratory, Tokyo Institute of Technology, 4259, Nagatsuta, Midori-ku, Yokohama-city, Japan
Abstract:The photo-enhanced reaction between metallic silver and amorphous chalcogenides is known as “photodoping”. Diffusion of silver in chalcogenides associated with photodoping has been investigated by an optical edge tracing technique using a microscopic spectrophotometer. It is suggested that the photodoping with silver involves two different steps; a photochemical reaction between metallic silver and chalcogenides by the aid of photo-excitation of chalcogenides and the diffusion of silver in the doped region. The amount of the silver diffusing through the doped region is about 20% of the maximum amount of the silver dissolved in the chalcogenide layer. Diffusion of silver in a chalcogenide containing sulfur or germanium is very slow compared with that in a chalcogenide containing selenium or tellerium, indicating that the diffusion rate of silver greatly depends upon the chemical composition of the chalcogenide. Further, the diffusion of silver in As2Se3 film proceeds at least 100 times faster with light of 4 mW/cm2 and 380 nm in wavelength than it does in the dark. It is also confirmed that light excitation in the region doped with silver effectively causes photodoping.
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