Properties of low-refractive-index films obtained by the close-spaced vapor transport technique under the sublimation of graphite in a quasi-closed volume |
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Authors: | N V Sopinskii V S Khomchenko O S Litvin A K Savin N A Semenenko A A Evtukh V P Sobolevskii G P Ol’khovik |
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Institution: | 1.Lashkarev Institute of Semiconductor Physics,National Academy of Sciences of Ukraine,Kiev,Ukraine |
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Abstract: | The properties of low-refractive-index carbon films obtained by close-spaced vapor transport at graphite sublimation are studied.
The optical properties of the films are investigated by monochromatic multiple-angle ellipsometry, and their morphology is
examined by AFM. It is found that the films have a columnar structure with a background surface roughness of about 1 nm. In
addition, the surface of the film contains islands up to 50 nm in height with a footprint of ≈200 nm. A low-refractive-index
carbon film deposited by close-spaced vapor transport on silicon tips is found to decrease the field emission threshold and
drastically raise the current. |
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