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Photochemical generation of highly destabilized vinyl cations: the effects of alpha- and beta-trifluoromethyl versus alpha- and beta-methyl substituents
Authors:van Alem Kaj  Belder Geerte  Lodder Gerrit  Zuilhof Han
Institution:Leiden Institute of Chemistry, Gorlaeus Laboratories, Leiden University, P.O. Box 9502, 2300 RA Leiden, The Netherlands.
Abstract:The photochemical reactions in methanol of the vinylic halides 1-4, halostyrenes with a methyl or a trifluoromethyl substituent at the alpha- or beta-position, have been investigated quantitatively. Next to E/Z isomerization, the reactions are formation of vinyl radicals, leading to reductive dehalogenation products, and formation of vinyl cations, leading to elimination, nucleophilic substitution, and rearrangement products. The vinyl cations are parts of tight ion pairs with halide as the counterion. The elimination products are the result of beta-proton loss from the primarily generated alpha-CH(3) and alpha-CF(3) vinyl cations, or from the alpha-CH(3) vinyl cation formed from the beta-CH(3) vinyl cation via a 1,2-phenyl shift. The beta-CF(3) vinyl cation reacts with methanol yielding nucleophilic substitution products, no migration of the phenyl ring producing the alpha-CF(3) vinyl cation occurs. The alpha-CF(3) vinyl cation, which is the most destabilized vinyl cation generated thus far, gives a 1,2-fluorine shift in competition with proton loss. The experimentally derived order of stabilization of the vinyl cations photogenerated in this study, alpha-CF(3) < beta-CF(3) < beta-CH(3) < alpha-CH(3), is corroborated by quantum chemical calculations, provided the effect of solvent is taken into account.
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