Effect of thermal history on conductivity and electrical relaxation in alkali silicate glasses

Electrical conductivity σ₀ and electric field relaxation measurements have been carried out as a function of thermal history for two alkali silicate glasses, Na₂O3SiO₂ and K₂O3SiO₂. Specimens of each glass with three different thermal histories, two of the anneal-and-quench type and one of the rate-cool type, were studied. The average structural or fictive temperature T_f of each of the specimens was characterized by measuring their indices of refraction. Effects of thermal history on σ₀ and its activation enthalpy $\text{H}{}_{\mathrm{\sigma }}{}^1$ were in accord with results of previous investigators. That is, for a given type of thermal history σ₀ was lower and $\text{H}{}_{\mathrm{\sigma }}{}^1$ higher the lower T_f. In addition it was found that for two specimens with the same T_f or index of refraction but different thermal histories the rate-cooled specimen exhibited a lower conductivity than the annealed-and-quenched specimen, in accord with the results of Ritland. The distribution of relaxation times τ_σ for decay of the electric field due to ionic migration was found to be due primarily to a distribution in the pre-exponential term ln $\text{τ}{}_{\mathrm{\sigma }}{}^1$ in the equation $\text{ln}\text{τ}{}_{\mathrm{\sigma }}\text{=}\text{ln}\text{τ}{}_{\mathrm{\sigma }}{}^1\text{+ H}{}^1\text{/RT}$; the distribution in $\text{H}{}^1$ was extremely narrow. Differences in thermal history caused small differences in the distribution of τ_σ, but no difference in the average activation enthalpy $\text{〈H}{}^1\text{〉}$ for τ_σ. From this result it appeared that the dependence of the conductivity activation enthalpy $\text{H}{}_{\mathrm{\sigma }}{}^1$ on thermal history was due to the effect of thermal history on the temperature dependence of the distribution in τ_σ.