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Generation of cold electrons in the downstream region of a microwave plasma source with near boundary resonances for production of negative ions
Authors:D Sahu  S Bhattacharjee  M Bandyopadhyay and A K Chakraborty
Abstract:A microwave driven multicusp plasma based volume negative ion source equipped with a magnetic filter is developed. Instead of employing any electrodes or current carrying filaments, microwaves of frequency 2.45 GHz is used to generate plasma by resonance heating mechanisms namely the electron cyclotron resonance (ECR) and upper hybrid resonances (UHR), occurring near the boundary plasma layers. The principal process of negative ion production in hydrogen is dissociative attachment of low energy (0.5–1.0 eV) electrons to vibrationally excited neutral molecules generated from high energy (15–20 eV) electron impact. The source therefore necessitates two distinct spatial regions (a) production and (b) attachment chambers; which would contain electrons with optimum cross section for the aforementioned processes. A biased grid after the magnetic filter further helps to lower down the electron temperature to ≤1 eV which is favorable for the dissociative attachment process.
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