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| 氩离子刻蚀还原氧化铜的XPS研究 | |
| 引用本文： | 李晓莉,谢方艳,龚力,张卫红,于晓龙,陈建. 氩离子刻蚀还原氧化铜的XPS研究[J]. 分析测试学报, 2013, 32(5): 535-540 |
| 作者姓名： | 李晓莉 谢方艳 龚力 张卫红 于晓龙 陈建 |
| 作者单位： | 1. 海南大学材料与化工学院,海南海口570228;中山大学测试中心,广东广州510275 2. 中山大学测试中心,广东广州,510275 3. 海南大学材料与化工学院,海南海口,570228 |
| 基金项目： | 国家自然科学基金资助项目(51072236，21106190)；广东省自然科学基金项目(105102750100094)；佛山市科技计划项目(2011BC100023) |
| 摘 要： | 利用X射线光电子能谱(XPS)及氩离子刻蚀技术,通过改变氩离子枪的刻蚀模式,原位研究氩离子刻蚀对氧化铜的还原情况。结果发现在极其微弱的氩离子束流轰击下,CuO即被还原,刻蚀初期变化较大,之后达到稳恒状态。对Cu2p峰拟合,同时结合俄歇CuLMM峰变化,判定纯CuO经氩离子刻蚀后最终转变为氧化铜、氧化亚铜及少量单质铜的共存状态。研究结果将对氧化铜深度剖析中化学状态的判断具有重要参考价值。 |
| 关 键 词： | 氧化铜 氩离子刻蚀 X射线光电子能谱 还原 |
Effect of Argon Ion Bombardment on Copper Oxide Studied by X-ray Photoelectron Spectroscopy |
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| LI Xiao-li , XIE Fang-yan , GONG Li , ZHANG Wei-hong , YU Xiao-long , CHEN Jian. Effect of Argon Ion Bombardment on Copper Oxide Studied by X-ray Photoelectron Spectroscopy[J]. Journal of Instrumental Analysis, 2013, 32(5): 535-540 | |
| Authors: | LI Xiao-li XIE Fang-yan GONG Li ZHANG Wei-hong YU Xiao-long CHEN Jian |
| Affiliation: | 1.School of Materials and Chemical Engineering,Hainan University,Haikou 570228,China;2.Instrumental Analysis & Research Center,Sun Yat-sen University,Guangzhou 510275,China) |
| Abstract: | Effect of argon ion bombardment on copper oxide was investigated by in situ X-ray photo-electron spectroscopy(XPS).It turned out that CuO can be reduced under extremely weak argon ion beam condition.At the initial stage of the whole bombardment process,Cu2p XPS spectra and CuLMM Auger spectra changed drastically.The final chemical state is the coexistence state of CuO and Cu2O with a small amount of Cu by analyzing Cu2p and CuLMM Auger peaks.The important reference values were obtained for the determination of the chemical states in the depth analysis of copper oxide. |
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