| 薄膜厚度测控技术中的物理原理 |
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| 引用本文： | 许世军.薄膜厚度测控技术中的物理原理[J].物理与工程,2001,11(2):38-41. |
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| 作者姓名： | 许世军 |
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| 作者单位： | 西安工业学院数理系,西安,710032 |
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| 摘 要： | 针对当前应用较为广泛的各种薄膜厚度测控技术，简明介绍了光电极值法，干涉法，石英晶体振荡法及椭偏仪法的物理原理及其应用。
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| 关 键 词： | 膜厚测控 干涉法 石英晶体振荡法 椭偏仪法 光晶极值法 薄膜技术 |
THE PHYSICS PRINCIPLES ON MEASURING AND CONTROLLING THIN FILM THICKNESS |
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| Xu Shijun.THE PHYSICS PRINCIPLES ON MEASURING AND CONTROLLING THIN FILM THICKNESS[J].Physics and Engineering,2001,11(2):38-41. |
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| Authors: | Xu Shijun |
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| Abstract: | In accordance with many measurement and controlling technologies of thin film thickness which are widespreadly used today, four physics principles and their uses including photoelectic maximum method, interferential method, quartz crystal oscillating method and ellipsometry are introduced simply. |
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| Keywords: | measuring and controlling thin film thickness maximum method interferential method quartz crystal oscillating method ellipsometry |
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