首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Atomic scale simulation of physical sputtering of silicon oxide and silicon nitride thin films
Institution:1. Surface Technology Research Center, Korea Institute of Machinery and Materials (KIMM), 66, Sangnam-Dong, Changwon, Kyungnam 641-010, Korea;2. Department of Chemical & Biomolecular Engineering, 373-1, Guseong-dong, Yuseong-gu, Daejeon 305-701, Korea;1. Division of Materials Science and Engineering, Hanyang University, Seoul 04763, Korea;2. Institute of Nano Science and Technology, Hanyang University, Seoul 04763, Korea;3. Division of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, Korea
Abstract:
Keywords:
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号