Transport properties of microcrystalline silicon,prepared at high growth rate |
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Affiliation: | 1. Materials Science Department, FCT-UNL, Campus da Caparica, Portugal;2. INESC Microsistemas e Nanotecnologias, Lisbon, Portugal;3. Department of Chemical and Biological Engineering, IST-UTL, Lisbon, Portugal |
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Abstract: | Amorphous/microcrystalline transition was studied in the high growth-rate depositions of hydrogenated silicon films at a high pressure (700 Pa) in a depletion regime using a series of samples with the ratio of hydrogen to silane flows from 10 to 32. Results show the characteristic features of the amorphous/microcrystalline transition: abrupt change of dark conductivity and crystallinity accompanied by peaks of roughness and diffusion length, observed previously at standard growth rates. |
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