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Epitaxial growth of Co2Cr0.6Fe0.4Al Heusler alloy thin films on MgO (0 0 1) substrates by magnetron sputtering
Institution:1. Laboratory of Physical Chemistry of Materials, Faculty of Science of Monastir, Department of Physics, 5019, University of Monastir, Monastir, Tunisia;2. Buraydah of Technical College at Al-Asyah, Al-Asyah - King Abdulaziz Road, PB: 304, Al-Asyah 51971, Kingdom of Saudi Arabia;3. Neel Institute, CNRS and Joseph Fourier University, PB: 166, Grenoble 38042, France;1. Laiwu Vocational and Technical College, Laiwu, Shandong Province, 271100, PR China;2. School of Physics Science and Information Engineering, Liaocheng University, Liaocheng, Shandong Province, 252059, PR China;3. School of Science, Shandong University of Technology, Zibo, Shandong Province, 255049, PR China;1. Research Center for Magnetic and Spintronic Materials, National Institute for Materials Science, Tsukuba 305-0047, Japan;2. Department of Physics, Indian Institute of Technology Guwahati, Guwahati 781039, India;3. Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba 305-8571, Japan;1. Thin Film Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016, India;2. Department of Materials Science and Engineering, Uppsala University, Box 534, SE-75121 Uppsala, Sweden;1. School of Physical and Applied Sciences, Goa University, Taleigao Plateau, Goa, 403 206, India;2. High Pressure and Synchrotron Radiation Physics Division, Bhabha Atomic Research Centre, Mumbai, 400 085, India;3. UGC-DAE Consortium for Scientific Research, Mumbai Centre, BARC Campus, Mumbai, 400 085, India
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