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Influence of hydrogen on the thermomechanical properties of a-CNx:H and a-CNx films deposited by glow discharge and ion beam assisted deposition
Affiliation:Physics Institute ‘Gleb Wathagin’, State University at Campinas (UNICAMP), Cidade Universitário Zeferino Vaz-GPOMS/DEQ/IFGW, Barão Geraldo, 13083970-Campinas, Caixa-Postal: 6165 SP, Brazil
Abstract:The coefficient of thermal expansion (CTE), Young’s modulus, Poisson’s ratio, stress and hardness of a-CNx and a-CNx:H were investigated as a function of nitrogen concentration. Hydrogenated films were prepared by glow discharge, GD, and unhydrogenated films were prepared by ion beam assisted deposition, IBAD. Using nanohardness measurements and the thermally induced bending technique, it was possible to extract separately, Young’s modulus and Poisson’s ratio. A strong influence of hydrogen, in a-CNx:H films, was observed on the CTE, which reaches about ∼9 × 10−6 C−1, close to that of graphite (∼8 × 10−6 C−1) for nitrogen concentration as low as 5 at.%. On the other hand, the CTE of unhydrogenated films increases with nitrogen concentration at a much lower rate, reaching 5.5 × 10−6 C−1 for 33 at.% nitrogen.
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