Depth of origin of sputtered atoms |
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Authors: | G Falcone P Sigmund |
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Institution: | (1) Fysisk Institut, Odense Universitet, DK-5230 Odense M, Denmark;(2) Present address: Dipartimento di Fisica, Universita della Calabria, I-87036 Cosenza, Italy |
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Abstract: | Estimates are given for the distribution of the depth of origin of sputtered atoms in the low-fluence limit, as well as the
corresponding distribution of atoms sputtered into a given energy interval. The former distribution is well described by an
exponential profile, with the characteristic depth being consistent with previous results. The latter distribution is characterized
by an energy-dependent depth scale and a shape that varies from exponential at low sputtered-atom energies to inverse-power
form at higher energies. |
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Keywords: | 79 20 68 55 61 80 34 |
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