Optical studies on the deposition of carbon nitride films by laser ablation |
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| Authors: | Z.-M. Ren P.-N. Wang Y.-C. Du Z.-F. Ying F.-M. Li |
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| Affiliation: | (1) T.D.Lee Physics Laboratory, State key joint laboratory for material modification by laser, ion and electron beams, Department of Physics, Fudan University, Shanghai, 200433, P.R. China, CN |
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| Abstract: | 2 radicals when the 355 and 1064 nm outputs of a Nd:YAG laser were applied. While for the 532 nm ablation, a relatively higher concentration of excited atomic carbon was obtained. Different Raman and FTIR spectral features were observed from the deposited films with different ablation wavelengths. The 532 nm laser ablation is proposed for the synthesis of high quality carbon nitride films. Received: 16 October 1996 / Accepted: 11 April 1997 |
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| Keywords: | PACS: 81.15.-z 79.60.-i 81.15.j |
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