Electrochemical properties of stoichiometric RuN film prepared by rf-magnetron sputtering: A preliminary study |
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| Affiliation: | 1. Dipartimento di Scienze Chimiche e Farmaceutiche, Università degli Studi di Ferrara, via Fossato di Mortara 17, 44121 Ferrara, Italy;2. Dipartimento di Scienze Molecolari e Nanosistemi, Università Ca'' Foscari Venezia, Via Torino 155/B, 30170 Mestre— VE, Italy;1. Nanomaterials Processing Lab., School of Electronic Engineering, Dublin City University, Dublin 9, Ireland;2. Tyndall National Institute, University College Cork, Lee Maltings, Prospect Row, Cork, Ireland;3. School of Physical Sciences, Dublin City University, Dublin 9, Ireland;1. TQC, Universiteit Antwerpen, Universiteitsplein 1, B-2610 Antwerpen, Belgium;2. Department of Theoretical Physics, State University of Moldova, Republic of Moldova;3. Lyman Laboratory of Physics, Harvard University, United States |
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| Abstract: | The electrochemical properties and stability of ruthenium mononitride (RuN) thin films were studied. Coatings of RuN were synthesized on electropolished titanium supports by rf-magnetron sputtering. RuN electrodes appear rather stable against dissolution, independently of pH, but show to possess the greatest stability only in alkaline environment. Under hydrogen evolution conditions the films show relevant catalytic properties, comparable with Pt, Pd and Ru/Ir derivatives; a significant coverage by adsorbed reaction intermediates is involved. These electrodes are of potential application in energetics and sensoring. |
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