Three-dimensional depth profiling of molecular structures |
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Authors: | A Wucher J Cheng L Zheng N Winograd |
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Institution: | 1.Fachbereich Physik,Universit?t Duisburg-Essen,Duisburg,Germany;2.Department of Chemistry,Pennsylvania State University,University Park,USA;3.Merck & Co., Inc.,West Point,USA;4.Evans Analytical Group,Sunnyvale,USA |
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Abstract: | Molecular time of flight secondary ion mass spectrometry (ToF-SIMS) imaging and cluster ion beam erosion are combined to perform
a three-dimensional chemical analysis of molecular films. The resulting dataset allows a number of artifacts inherent in sputter
depth profiling to be assessed. These artifacts arise from lateral inhomogeneities of either the erosion rate or the sample
itself. Using a test structure based on a trehalose film deposited on Si, we demonstrate that the “local” depth resolution
may approach values which are close to the physical limit introduced by the information depth of the (static) ToF-SIMS method
itself. |
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Keywords: | |
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