微/纳米CVD金刚石涂层沉积工艺参数优化

通过正交实验设计工艺参数,利用热丝化学气相沉积法(HFCVD)制备金刚石涂层,采用扫描电镜、洛氏硬度计、X射线衍射仪等对金刚石涂层进行性能表征,同时进行切削试验,从而确定微米层和纳米层最佳的碳源浓度、沉积气压、热丝与基体间距.结果表明:最优微米金刚石涂层沉积工艺参数为碳源浓度2;,沉积气压3 kPa,热丝/基体间距5 mm.最优纳米金刚石涂层沉积工艺参数为碳源浓度5;,沉积气压5 kPa,热丝/基体间距8 mm.

Process Parameters Optimization of Micro/Nano-crystalline CVD Diamond Coatings

The process parameters were designed by orthogonal experiment.Diamond coatings were synthesized by Hot Filament Chemical Vapor Deposition (HFCVD) and the scanning electron microscopy (SEM), rockwell hardness tester, X-ray diffraction (XRD) were used to test the coating properties and cutting tests to determine the optimum carbon source concentration, deposition pressure and hot wire/substrate spacing for the micro and nano layers.The results show that the optimum micro-diamond coating deposition process parameters are carbon source concentration of 2%, deposition pressure 3 kPa, hot wire/substrate spacing 5 mm.The optimum nano-diamond coating deposition process parameters are Carbon source concentration of 5%, deposition pressure 5 kPa, hot wire/substrate spacing 8 mm.