Additive Tuning of Redox Potential in Metallacarboranes by Sequential Halogen Substitution |
| |
| Authors: | Patricia González‐Cardoso Anca‐Iulia Stoica Dr Pau Farràs Dr Ariadna Pepiol Clara Viñas Prof Dr Francesc Teixidor Prof Dr |
| |
| Institution: | 1. Institut de Ciència de Materials de Barcelona (CSIC), Campus de la U.A.B., 08193 Bellaterra (Spain), Fax: (+34)?935805729;2. On leave from the Department of Analytical Chemistry, University of Bucharest (Romania) |
| |
| Abstract: | The first artificially made set of electron acceptors is presented that are derived from a unique platform Cs3,3′‐Co(C2B9H11)2], for which the redox potential of each differs from its predecessor by a fixed amount. The sequence of electron acceptors is made by substituting one, two, or more hydrogen atoms by chlorine atoms, yielding Cs3,3′‐Co(C2B9H11?yCly)(C2B9H11?zClz)]. The higher the number of chlorine substituents, the more prone the platform is to be reduced. The effect is completely additive, so if a single substitution implies a reduction of 0.1 V of the redox potential of the parent complex, then ten substitutions imply a reduction of 1 V. |
| |
| Keywords: | chlorination electron transport metallacarboranes redox chemistry voltammetry |
|
|
