Thin films of mesoporous silica: preparation and characterization

Preparation of mesoporous materials in a thin film geometry was first reported in 1996. Recently, improvement of the preparation methods yielded stable films with well-defined symmetries, controlled pore orientation, continuity and film thickness. The ability to tailor film properties is important for their utilization in applications ranging from catalysis to microelectronics, where morphological control in the meso-domain is vital.